Zhongdao Optoelectronics Wafer defect detection equipment
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Zhongdao Optoelectronics Wafer defect detection equipment
The supplier hasn’t listed a price. We can get their current prices and MOQ.
Verify from $29 · written report in 3 business days · 100% refund if unreachable
About this product
- Size: ·
- Color: ·
- Certification: Other
- Waterproof: Other
- IP rating: Other
- Usage: Other
- Exports to: Mainland China, Africa, Middle East, Southeast Asia, South Asia, Central Asia, USA and Canada, Latin America
About this product
- Size: ·
- Color: ·
- Certification: Other
- Waterproof: Other
- IP rating: Other
- Usage: Other
- Exports to: Mainland China, Africa, Middle East, Southeast Asia, South Asia, Central Asia, USA and Canada, Latin America
Product details
| Size | · |
|---|---|
| Color | · |
| Certification | Other |
| Waterproof | Other |
| IP rating | Other |
| Usage | Other |
| Customized | Other |
| Display method | Other |
| Material | Other |
Product details
| Size | · |
|---|---|
| Color | · |
| Certification | Other |
| Waterproof | Other |
| IP rating | Other |
| Usage | Other |
| Customized | Other |
| Display method | Other |
| Material | Other |
From the supplier
The nano level patterned wafer defect detection equipment of Zhongdao Optoelectronics (series: NanoPro-1XX) can be applied in the front-end process of power chips, compatible with 150mm&200mm wafers, and equipped with bright/dark field multi-channel mode, with a maximum detection accuracy of up to 150nm. This series is one of the few devices in China that can achieve simultaneous scanning of bright and dark fields, solving the problem of slow throughput caused by separate scanning of bright and dark fields. It also independently develops and introduces advanced AI algorithms and software, further improving defect detection in key processes.
From the supplier
The nano level patterned wafer defect detection equipment of Zhongdao Optoelectronics (series: NanoPro-1XX) can be applied in the front-end process of power chips, compatible with 150mm&200mm wafers, and equipped with bright/dark field multi-channel mode, with a maximum detection accuracy of up to 150nm. This series is one of the few devices in China that can achieve simultaneous scanning of bright and dark fields, solving the problem of slow throughput caused by separate scanning of bright and dark fields. It also independently develops and introduces advanced AI algorithms and software, further improving defect detection in key processes.
About the supplier
- ✓Exhibited at 2 recent Canton Fairs
- ✓Foreign Trade Company
- ✓Founded 1999
- ✓1 certificate on file
- Exhibited at 2 recent Canton Fairs
- Foreign Trade Company
- Founded 1999
- 1 certificate on file
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