Photolithography machine, also known as mask alignment exposure machine, is the core equipment of photolithography process in chip manufacturing process. Its main purpose is to produce integrated circuits by replicating designed integrated circuit templates onto silicon wafers, thereby producing small, precise, and efficient integrated circuits. According to the exposure method of lithography machines, they can be mainly divided into contact lithography machines, proximity lithography machines, and direct writing lithography machines. Among them, direct writing lithography machines can be further divided into two types based on whether they need to use a mask plate: with mask and without mask. Maskless lithography machine is a type of lithography machine that does not require the use of traditional mask plates. It directly exposes the wafer to achieve pattern transfer, enabling faster production of specific products and cost reduction. In addition to meeting traditional 2D lithography requirements, it can also achieve 2.5D lithography (i.e. grayscale lithography). The advantages of maskless lithography machines, such as not requiring a mask plate and being highly flexible, make them widely used in scientific research, customized production, rapid prototyping, electronic devices, biomedicine, optical components, micromechanics, and other fields.
The research version of the maskless lithography machine has the advantages of high flexibility, high precision, and maskless, making it very suitable for scientific research. The ACA series is a research version of the maskless UV lithography machine, which is based on spatial light modulation technology and achieves digital mask lithography. Its ultimate flexibility makes it the best choice for scientific research. The device is equipped with a long-lasting, high-power ultraviolet light source, which is stable and easy to operate. Its unique in-situ light painting and interactive overlay guidance function make lithography and overlay easier and more accurate. The ACA series equipment provides strong support for scientific research work, helping to promote the development and innovation of the scientific research field.
TTT-07-UV Litho-ACA Maskless Lithography Machine Highlights: Feature Size 0.8 μ m 6-inch Lithography Area High Precision Step Lithography Maskless Lithography Machine
TTT-07-UV Litho ACA Pro Maskless Lithography Machine Highlights: Feature Size 0.4 μ m 6-inch Lithography Area High Precision Step Lithography Maskless Lithography Machine
TTT-07-UV Litho ACA Master Maskless Lithography Machine Highlights: Feature Size 0.4 μ m 6-inch Lithography Area Scan Lithography/Step Lithography Switchable Maskless Lithography Machine